Sie sind hier: FRIAS School of Soft Matter … Fellows Margit Zacharias

Margit Zacharias

IMTEK Nanotechnology
Freiburg, Germany
October 2011 - October 2013

Freiburg Institute for Advanced Studies
School of Life Sciences - LifeNet
Albertstr. 19
79104 Freiburg im Breisgau

Tel. +49 (0)761 / 203 7421
Fax +49 (0)761 / 203 7222


    Margit Zacharias obtained her Diploma in Physics (Solid State Physics) from the University of Leipzig in 1980, and her Ph.D. in Electrical Engineering from the University of Magdeburg in 1984. In 1999 she got her habilitation in Experimental Physics at the University of Magdeburg. She joined the Max Planck Institute of Microstructure Physics/Halle in 2000 with a position in the prestigious C3 program of the Max Planck Society where she established and led the Nanocrystals and Nanowires Group. This was followed by a move in 2006 to the University of Paderborn, Germany, where she was a Professor for Applied Physics. In 2007 she moved to the Albert Ludwigs University in Freiburg, joined the Institute of Microsystems Engineering (IMTEK) and runs the Laboratory for Nanotechnology.

    Prof. Zacharias is a curator of the Physik-Journal. She is the German representative of the Nanoscience Division of IUVSTA International Union for Vacuum Science, Technique and Applications.

    Prof. Zacharias is author or co-author of more than 160 publications in the broad area of nanomaterials and nanotechnology. She is a program committee member for numerous conferences. Her research interests cover the development of new materials based on nanocrystals and nanowires and their applications. Low cost nanostructuring methods, nanotemplates and the deeper understanding of the interaction and functionalization of nanomaterials for optics, sensoric and photovolaics are in the focus of her research.


    Selected Publications

    1. K. Subannajui, F. Guder, J. Danhof, A. Menzel, Y. Yang, L. Kirste, C. Wang, V. Cimalla, U. Schwarz, M. Zacharias: An advanced fabrication method of highly ordered ZnO nanowire arrays on silicon substrates by atomic layer deposition. Nanotechnology, 2012; 23 (23): 235607-235607.