Dr. Yoshikazu Hirai
Department of Micro Engineering,
Kyoto University, Japan

"MOVING-MASK UV LITHOGRAPHY FOR 3D THICK-PHOTORESIST MICROSTRUCTURING"
 
The  talk will describe a systematic study on the moving-mask UV lithography technique for 3D (3-dimensional) thickphotoresist microstructuring. As an application of the moving-mask UV lithography, a very simple fabrication method for a monolithic 3D embedded microstructure using a negative photoresist is proposed. Furthermore, a sequential development profile simulation based on experimentally characterized thick-photoresist dissolution rate is proposed. The simulated results demonstrate a good agreement with the measured cross-sectional shape which has never presented before in the area of 3D thickphotoresist microstructuring.